American materials scientist Elsa Reichmanis, whose pioneering work helped establish the foundation for modern semiconductor manufacturing, has called for scientific collaboration to rise above geopolitical rivalry. She made these remarks after receiving one of China’s highest honours for foreign experts, the China International Science and Technology Cooperation Award.

Reichmanis, a professor of chemical engineering at Lehigh University and director of its Institute for Functional Materials and Devices, was among nine recipients of the award presented in early July. The ceremony took place on July 8, 2026, at the Great Hall of the People in Beijing.

The award recognizes exceptional contributions to scientific exchanges and collaboration with Chinese researchers. Recipients hailed from eight countries, including the US, France, Germany, the Netherlands, Russia, Australia, Belgium, and Portugal, and represented fields such as marine engineering, artificial intelligence, photovoltaics, and oncology.

Reichmanis is best known for her groundbreaking work on chemically amplified photoresists—light-sensitive materials essential for etching microscopic circuits onto silicon wafers. Her innovations made it commercially viable to integrate tens of millions of transistors onto a single silicon chip, laying the groundwork for the nanoscale semiconductor industry.

In an interview with the South China Morning Post, the 72-year-old scientist said, “I was shocked” upon receiving the award. She described science as “a universal language” that benefits all of society and stressed that collaboration should transcend rivalry.

The China International Science and Technology Cooperation Award was established in 1994 by the State Council, China’s cabinet, to honor those who collaborate with Chinese partners on significant scientific achievements, introduce advanced technologies, cultivate domestic scientific talent, and promote international scientific exchange and cooperation.

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